Location: Los Alamos, NM
Cap-Exempt H-1B Position — No lottery required
**What You Will Do** The Engineered Materials Group (MST-7) is seeking outstanding candidates to perform deposition and analysis of Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), and/or Chemical Solution deposition (CSD) coatings. The candidate is expected to work independently and lead deposition/analysis method development. Regular dissemination of results in the form of well-kept laboratory notebooks, internal reports, peer-reviewed research papers, and conference presentations will be essential for success. The Surface & Interface Engineering Team R&D Technologist will support MST-7 and other organizations across LANL. MST-7's mission is to use our materials science expertise to address national security needs. This requires maintaining excellence in fundamental materials science, innovative materials development, and synthesis of unique thin films and coatings coupled with cutting edge materials fabrication processes, advanced characterization techniques and world class ultra-precision design and machining. We apply a multi-disciplinary approach to push the state-of-the-art in engineered materials to be responsive to emergent national security requirements, trusted stakeholders, and production agency needs. **The candidate should have the ability to meet the following job duties:** - Safety and security are a primary responsibility for all Laboratory employees. Assures safety and security compliance, maintains required safety and security training, and makes safety and security an integral part of every task. - Contributes to the development of techniques and the fulfillment of research goals. Can resolve problems of moderately complex scope requiring review of a variety of factors. - Contributes to the development of new principles and concepts. - Works independently but under collaborative direction and guidance toward predetermined goals and objectives. - Work is checked through consultation and agreement with others and may involve formal